science-softCon uv/vis+ spectra data base;		www.uv-spectra.de; (C) science-softCon 2012

Substance: nitric acid				Other Names: 

Formula: HNO3					CAS-No.: 7697-37-2

Study: absorption cross sections, photolysis, quantum yields

                
Authors: O. Abida, J. Du, L. Zhu

Title: Investigation of the Photolysis of the Surface-Adsorbed HNO3 by Combining Laser Photolysis with Brewster Angle Cavity Ring-Down Spectroscopy

Journal/Source: Chem. Phys. Lett., 534, 77-82, (2012); http://dx.doi.org/10.1016/j.cplett.2012.03.034


Data: table

Energy/Wavelength range: 308 nm; 351 nm

Resolution: 

Temperature: 295 K

Temperature dependence: no

Pressure/Concentration: 

Phase: adsorbed on fused silica surfaces

pH:


Comments: The average excited NO2 quantum yields from the 308 and 351 nm photolysis of HNO3 adsorbed on fused silica surfaces are 1.1±0.2 and 1.0±0.3, respectively, where errors quoted (1sigma) represent measurement precision.  The authors previously obtained the excited NO2 quantum yields of 0.80±0.15 and 0.92±0.26 from the 308 nm photolysis of HNO3 on Al surface at 295 and 253 K , and an excited NO2 quantum yield of 0.60±0.34 from the 308 nm photolysis of HNO3 on ice film at 253 K.
The 308 nm absorption cross section of HNO3 on fused silica surface (1.2×10-18 cm2molecule-1) is 1140 times larger than that in the gas phase (1.1×10-21 cm2molecule-1).

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