science-softCon uv/vis+ photochemistry database;	www.photochemistry.org; (C) science-softCon 2019

Substance: hypochloric acid				Other Names: 

Formula: HOCl						CAS-No.: 7790-92-3

Study: photodecomposition, quantum yields

                
Authors: P.J.D. Butler, L.F. Phillips

Title: Upper limit for the atomic oxygen yield in the 308-nm photolysis of hydrogen oxide chloride (HOCl)

Journal/Source: J. Phys. Chem., 87 (1), 183-184, (1983); DOI: 10.1021/j100224a040


Data: 

Energy/Wavelength range: 308 nm

Resolution: 

Temperature: 

Temperature dependence: 

Pressure/Concentration: 

Phase:

pH:


Comments: An upper limit of PHI(HOCl + hv --> HCl + O) < 0.02 was determined at 308 nm.

Author to whom correspondence should be addressed: (e-mail address):