science-softCon uv/vis+ photochemistry database; www.photochemistry.org; (C) science-softCon 2019 Substance: hypochloric acid Other Names: Formula: HOCl CAS-No.: 7790-92-3 Study: photodecomposition, quantum yields Authors: M.J. Watts, K.G. Linden Title: Chlorine photolysis and subsequent OH radical production during UV treatment of chlorinated water Journal/Source: Water Research, 41, 2871-2878, (2007); doi:10.1016/j.watres.2007.03.032 Data: Energy/Wavelength range: 254 nm Resolution: Temperature: Temperature dependence: Pressure/Concentration: Phase: pH: Comments: The quantum yield of OH radical production from HOCl at 254 nm was found to be 1.4 mol Es-1, while the reaction of HOCl with OH radical was measured as 8.5×104 M-1 s-1. Author to whom correspondence should be addressed: (e-mail address):