science-softCon uv/vis+ photochemistry database; www.photochemistry.org; (C) science-softCon 2019 Substance: formic acid Other Names: Formula: HCOOH CAS-No.: 64-18-6 Study: photolysis, quantum yields, absorption cross sections Authors: D.L. Singleton, G. Paraskevopoulos, R.S. Irwin Title: Laser photolysis of carboxylic acids in the gas phase: direct determination of the hydroxyl quantum yield at 222 nm Journal/Source: J. Phys. Chem., 94, 695-699, (1990); DOI: 10.1021/j100365a034 Data: Energy/Wavelength range: 222 nm Resolution: Temperature: 298 K; 356.2 K Temperature dependence: yes Pressure/Concentration: Phase: vapor pH: Comments: The primary quantum yields for formation of OH radicals in the photolysis of the monomer and dimer of formic, acetic, and propionic acid vapor at 222 nm have been determined at 298 K and 356.2 K.. The OH quantum yields from the monomers were found to be: formic acid (0.70-0.80); acetic acid (0.55-0.70); propionic acid (0.15-0.35). The absorption cross sections were determined at 222 nm for both temperatures. Author to whom correspondence should be addressed: (e-mail address):